Pembuatan Lapis Tipis TiO2 pada Keramik Dengan Metode Dip Coating untuk Asam Humat

Abstract

TiO₂ thin layer on ceramic with dip coating method and photocatalyst activity test in humic acid. One of the photocatalysts used for the degradation of humic acid is TiO₂, because TiO₂ has several advantages, including non-toxic, stable, high activity, relatively cheap and environmentally friendlyThis study was performed using TTIP as a precursor and MEA as an additive in isopropanol. Addition of MEA influences the stability of the titanium solution. Ceramics were coated in a 0.5 M TiO₂ solution by a dip coating method, then dried in an oven at 110°C for 10 minutes and furnace at 400°C for 2 hours. The maximum degradation of humic acid during 24 hours is 57.73% and in the form of 3.76% using an 8-watt UV lamp.